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> Akrion/submicron 6" wafer automatic wet process station
Akrion/submicron 6" wafer automatic wet process station
Akrion/SubMicron AWS-I1-01-9539 Automatic 6" Wafer MegaSonic Wet Process Station
Comes with a manual and what you see in the pictures. If you don't see it, you probably wont get it.
The Unit's Serial Number Tag Reads:
Power Requirements: 208 V, 3 Phase, 60 Hz
The Akrion/SubMicron Systems AWS-I1-01-9539 is an automatic wet station for 6 inch wafer processing. It uses DI Water with heating, sulfuric acid, ammonia hydroxide, hydrogen peroxide, hydrofluoric acid, hydrochloric acid, and MegaSonics to clean and process wafers.
This section is a model number MR400D. it houses 2 ENI AP400 BM3 Power Supplies. Each one is 80 kHz to 2.7 MHz and 0 to 500 Watts.
In-Line Heater Section and Tank #1 MegaSonic Section Control:
This section has a model number of 9E00015 and says Tank #1 and a box says In-Line Heater Box. This houses a diaphragm pump made by Almatec and says it has a mixture of ammonium hydroxide, hydrogen peroxide, and Water in a 5:1:1 mix respectively.
#1 Wet Bench Section (HOT SC1 & HOT SC2):
The HOT SC1 has 1 Quartz Tank and was using 2% ammonium hydroxide, 4% hydrogen peroxide, and 94% water. It also has a DI Water tank which I assume is for rinse.
The HOT SC2 has a temperature marking of 70°C and the quartz tank was using 2% hydrogen peroxide, 2% hydrochloric acid, and 96% DI Water. There is also a smaller quartz tank.
This station has only Teflon (I believe) tanks, there are 2 tanks though 1 was removed from the system and is separate. There are no quartz tanks as they look like they were removed from it. The left side of the station was using 80% sulfuric acid, 5% hydrogen peroxide, and it doesn't say what else. The right side just says 5.0% hydrofluoric acid.
There is no computer with it. There is a joystick, fire protection control, temperature controllers, and gas flow adjustments.
For More Pictures Please Click the Following:
